LSS-50CH Semiconductor - Pneumatic Hydraulic High-Pressure Pump

Pneumatic Reciprocating High-Pressure Pump, Max Outlet Pressure 390bar, Ideal for Semiconductor Cleaning Processes

Key Features

Powered by dry, clean, oil-free compressed air
Pneumatic piston reciprocating motion for high-pressure liquid transport
Maximum discharge pressure: 390bar — ideal for high-pressure applications
Suitable for cleaning production equipment, film stripping, and semiconductor wet processes.
Main drive air pressure 0.4-0.7 MPa; maximum not to exceed 0.8MPa
Leakage drain port design with real-time seal status monitoring

Product Type

Pneumatic Reciprocating High-Pressure Liquid Pump

Drive Air Pressure

0.4-0.7 MPa (Max 0.8 MPa)

Pilot Air Pressure

0.3-0.7 MPa

Liquid inlet pressure

0.5-7 bar

Product Type	Pneumatic Reciprocating High-Pressure Liquid Pump
Drive Air Pressure	0.4-0.7 MPa (Max 0.8 MPa)
Pilot air pressure	0.3-0.7 MPa
Liquid inlet pressure	0.5-7 bar
Maximum Outlet Pressure	390 bar
Maximum Liquid Flow Rate	0.94 L/min
Single-stroke displacement	Approximately 15.67 cc
Maximum Stroke Frequency	≤60 times/minute
Suggested Run Frequency	Approx. 30 times/minute
Air Consumption	510 L/min (at 7 bar)
Weight	Approx. 12 kg
For Liquids	Purified water, Isopropyl alcohol (IPA)
No liquids	NMP, slurries, abrasive liquids, highly corrosive solvents
Main Drive Port	1/2" or 3/4"
Pilot port	1/4"
Liquid inlet	3/8"
High-Pressure Outlet	3/8"
Leak Drain Port	1/8"

High-Pressure Cleaning and Film Stripping in Photovoltaic Wet Processes

Semiconductor Wafer Cleaning Equipment High-Pressure Liquid Delivery

High-Pressure Cleaning and Degreasing of Production Equipment

Scenarios requiring stable high-pressure liquid output

Our technical team will recommend the most suitable product model and configuration based on your specific use case.